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Laser Direct Writing & Plate‑Making Lithography
Laser direct writing lithography systems based on spatial light modulators or galvanometer scanners, with their mask‑free and programmable patterning capability, enable sub‑micron 2D and quasi‑3D structuring in applications such as diffractive optical elements, grayscale lithography, micro‑optics, and plate‑making lithography. Such systems impose stringent requirements on positioning accuracy, scanning smoothness, and multi‑axis coordination, especially during large‑area stitching exposure, nanometric autofocus, and angular alignment.
Coretech’s CFT‑XY integrated stages, Surface series planar air‑bearing stages, and high‑precision rotary stages deliver nanometer‑level resolution, sub‑micron repeatability, and excellent dynamic response, fully meeting the demanding needs of high‑speed pattern writing, precision focusing, and multi‑degree‑of‑freedom alignment in laser direct writing and plate‑making lithography.
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Empowerment Case Studies
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Improving Yield and Efficiency: High‑Precision Motion Stages Empowering Innovation in Laser Direct Writing Technology
In Micro/Nano Direct-Write Lithography Systems, the Stage's Exceptional Dynamic Performance Enhances Lithography Accuracy and Efficiency
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