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SMH-V Series

Long‑Stroke Direct‑Drive Vertical Lift Stage

The SMH‑V series is a nanometer‑precision Z‑axis lift stage, including models SMH115V‑010, SMH165V‑020, SMH190V‑035, and SMH225V‑050, with strokes of 12 mm, 22 mm, 37 mm, and 52 mm respectively. As a key complement to the ART130XY and SMH‑LM series horizontal stages, it offers compact dimensions, low profile, excellent accuracy and repeatability, fine minimum step resolution, high load capacity, and short step settling time. Its clever mechanical design ensures precision and load capacity while saving installation space.

Despite its compact build, the SMH‑V delivers robust driving capability with a maximum load of 60 kg. When equipped with linear amplifiers in a vibration‑isolated laboratory environment, it achieves in‑position stability and minimum step size below 20 nm, with repeatability better than ±200 nm. Typical applications include wafer defect inspection, optical lens inspection, biomedicine, and precision machining. Optional brakes with power‑off self‑locking are available without significantly increasing stage height, and custom strokes and higher load capacities can also be provided upon request.


Features Specifications Configuration Dimensions

Product Features

Hard-Core Capabilities Drive Exceptional Performance
Long‑stroke, low‑profile lift stage Long‑stroke, low‑profile lift stage

Long‑stroke, low‑profile lift stage

High load capacity High load capacity

High load capacity
(up to 60 kg)

Flexible configuration options Flexible configuration options

Flexible configuration options
(various strokes, optional power‑off brake)

Minimum step: 20 nm; repeatability: ±200 nm; accuracy: ±500 nm Minimum step: 20 nm; repeatability: ±200 nm; accuracy: ±500 nm

Minimum step: 20 nm; repeatability: ±200 nm; accuracy: ±500 nm

In‑position stability: 20 nm In‑position stability: 20 nm

In‑position stability: 20 nm
(with linear amplifiers and vibration‑isolated lab environment)

Specifications

Gain a comprehensive understanding of product information
平台型号\ModelSMH115V-010SMH165V-020SMH190V-035SMH225V-050
有效行程\Travel12 mm22 mm37 mm52 mm
绝对定位精度\Accuracy±500 nm±500 nm±500 nm±500 nm
双向重复定位精度\Bi-Repeatability±200 nm±200 nm±200 nm±200 nm
俯仰\Pitch10 arc sec10 arc sec10 arc sec13 arc sec
偏摆\Yaw10 arc sec10 arc sec10 arc sec13 arc sec
直线度\Straightness(1)±3.0 µm±3.0 µm±4.0 µm±5.0 µm
平台重量\Stage Mass1.7 kg6 kg11 kg18 kg
最大负载\Load Capacity(2)15 kg20 kg40 kg60 kg
分辨率\Resolution(3)10 nm
在位稳定性\In Position Stability (2)20 nm
最小步进量\Minimum Incremental step(3)20 nm
最大速度\Maximum Speed(4)15 mm/s15 mm/s15 mm/s15 mm/s
平台材质\Material
平均无故障时间\MTBF27,000 Hours
平台型号\ModelSMH115V-025SMH165V-070SMH165V-095
有效行程\Travel25 mm70 mm95 mm
绝对定位精度\Accuracy±500 nm±800 nm±1000 nm
双向重复定位精度\Bi-Repeatability±200 nm±400 nm±500 nm
俯仰\Pitch13 arc sec15 arc sec20 arc sec
偏摆\Yaw13 arc sec15 arc sec20 arc sec
直线度\Straightness(1)±4 µm±6 µm±9 µm
平台重量\Stage Mass2.6 kg11 kg13 kg
最大负载\Load Capacity(2)15 kg20 kg20 kg
分辨率\Resolution(3)10 nm
在位稳定性\In Position Stability (2)20 nm
最小步进量\Minimum Incremental step(3)20 nm
最大速度\Maximum Speed(4)15 mm/s15 mm/s15 mm/s
平台材质\Material
平均无故障时间\MTBF27,000 Hours

备注:

(1)平行或垂直于运动方向测量;

(2)沿轴线方向受力;

(3)适配-AS反馈,配置线性放大器;

(4)空载测试;

(5)默认测试点位置为台面上方25 mm,单轴指标,多轴系统的性能指标与实际载荷和工作点位置有关;

(6)其他行程可定制。


Model Selection and Configuration

Scientifically Formulated, Precisely Tailored to Your Needs
产品系列反馈
SMH115V-010-AS
SMH165V-020
SMH190V-035
SMH225V-050
SMH115V-025
SMH165V-070
SMH165V-095


反馈选项


-ASVPP 1伏正弦模拟量输入


Product Dimensions

Precise measurements—dimensions are clear at a glance



  SMH115V-010


  SMH165V-020

  SMH190V-035

  SMH225V-050

  SMH115V-025

  SMH165V-070

  SMH165V-095

  备注:

  (1)单位:mm。




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