SMH-V Series
The SMH‑V series is a nanometer‑precision Z‑axis lift stage, including models SMH115V‑010, SMH165V‑020, SMH190V‑035, and SMH225V‑050, with strokes of 12 mm, 22 mm, 37 mm, and 52 mm respectively. As a key complement to the ART130XY and SMH‑LM series horizontal stages, it offers compact dimensions, low profile, excellent accuracy and repeatability, fine minimum step resolution, high load capacity, and short step settling time. Its clever mechanical design ensures precision and load capacity while saving installation space.
Despite its compact build, the SMH‑V delivers robust driving capability with a maximum load of 60 kg. When equipped with linear amplifiers in a vibration‑isolated laboratory environment, it achieves in‑position stability and minimum step size below 20 nm, with repeatability better than ±200 nm. Typical applications include wafer defect inspection, optical lens inspection, biomedicine, and precision machining. Optional brakes with power‑off self‑locking are available without significantly increasing stage height, and custom strokes and higher load capacities can also be provided upon request.
Product Features
Long‑stroke, low‑profile lift stage
High load capacity
(up to 60 kg)
Flexible configuration options
(various strokes, optional power‑off brake)
Minimum step: 20 nm; repeatability: ±200 nm; accuracy: ±500 nm
In‑position stability: 20 nm
(with linear amplifiers and vibration‑isolated lab environment)
Specifications
| 平台型号\Model | SMH115V-010 | SMH165V-020 | SMH190V-035 | SMH225V-050 |
| 有效行程\Travel | 12 mm | 22 mm | 37 mm | 52 mm |
| 绝对定位精度\Accuracy | ±500 nm | ±500 nm | ±500 nm | ±500 nm |
| 双向重复定位精度\Bi-Repeatability | ±200 nm | ±200 nm | ±200 nm | ±200 nm |
| 俯仰\Pitch | 10 arc sec | 10 arc sec | 10 arc sec | 13 arc sec |
| 偏摆\Yaw | 10 arc sec | 10 arc sec | 10 arc sec | 13 arc sec |
| 直线度\Straightness(1) | ±3.0 µm | ±3.0 µm | ±4.0 µm | ±5.0 µm |
| 平台重量\Stage Mass | 1.7 kg | 6 kg | 11 kg | 18 kg |
| 最大负载\Load Capacity(2) | 15 kg | 20 kg | 40 kg | 60 kg |
| 分辨率\Resolution(3) | 10 nm | |||
| 在位稳定性\In Position Stability (2) | 20 nm | |||
| 最小步进量\Minimum Incremental step(3) | 20 nm | |||
| 最大速度\Maximum Speed(4) | 15 mm/s | 15 mm/s | 15 mm/s | 15 mm/s |
| 平台材质\Material | 铝 | |||
| 平均无故障时间\MTBF | 27,000 Hours | |||
| 平台型号\Model | SMH115V-025 | SMH165V-070 | SMH165V-095 |
| 有效行程\Travel | 25 mm | 70 mm | 95 mm |
| 绝对定位精度\Accuracy | ±500 nm | ±800 nm | ±1000 nm |
| 双向重复定位精度\Bi-Repeatability | ±200 nm | ±400 nm | ±500 nm |
| 俯仰\Pitch | 13 arc sec | 15 arc sec | 20 arc sec |
| 偏摆\Yaw | 13 arc sec | 15 arc sec | 20 arc sec |
| 直线度\Straightness(1) | ±4 µm | ±6 µm | ±9 µm |
| 平台重量\Stage Mass | 2.6 kg | 11 kg | 13 kg |
| 最大负载\Load Capacity(2) | 15 kg | 20 kg | 20 kg |
| 分辨率\Resolution(3) | 10 nm | ||
| 在位稳定性\In Position Stability (2) | 20 nm | ||
| 最小步进量\Minimum Incremental step(3) | 20 nm | ||
| 最大速度\Maximum Speed(4) | 15 mm/s | 15 mm/s | 15 mm/s |
| 平台材质\Material | 铝 | ||
| 平均无故障时间\MTBF | 27,000 Hours | ||
备注:
(1)平行或垂直于运动方向测量;
(2)沿轴线方向受力;
(3)适配-AS反馈,配置线性放大器;
(4)空载测试;
(5)默认测试点位置为台面上方25 mm,单轴指标,多轴系统的性能指标与实际载荷和工作点位置有关;
(6)其他行程可定制。
Model Selection and Configuration
| 产品系列 | 反馈 |
| SMH115V-010 | -AS |
| SMH165V-020 | |
| SMH190V-035 | |
| SMH225V-050 | |
| SMH115V-025 | |
| SMH165V-070 | |
| SMH165V-095 |
反馈选项
| -AS | VPP 1伏正弦模拟量输入 |
Product Dimensions
SMH115V-010

SMH165V-020

SMH190V-035

SMH225V-050

SMH115V-025

SMH165V-070

SMH165V-095

备注:
(1)单位:mm。
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