Nanoimprint Lithography

Stacked XY and rotary stages – deliver nanometer‑precision positioning, ensuring precise alignment with the template and improving pattern transfer fidelity.

Mechanical direct‑drive rotary stage – enables accurate alignment and contact positioning during the imprint process, further enhancing transfer accuracy.

Direct‑drive Z‑lift stage – precisely controls the upper‑lower contact process, accurately regulates imprint pressure, and ensures smooth, precise separation during demolding.